1. Film growth/surface analysis chamber

The big system consists of two interconnect connected high vacuum chambers for thin film growth by low temperature CVD and in-situ surface analysis. Techniques available are: spectroscopic ellipsometry, FT-IR, mass spectrometry, Auger and RHEED. The chamber contains a plasma source for assisting the growth process.


2. Oxide CVD chamber

The smaller system is used to deposit oxide and ferromagnetic films by low temperature CVD. A spectroscopic ellipsometer attached to the chamber analyzes growth process in-situ.


3. FTIR chamber

The FTIR system is used to investigate precursor desorption, adsorption and reaction on the surface during CVD process.


4. Static CVD

The static CVD system can be used for most single-source thin film deposition.